Preparation of UiO-66-NH2@PDA under Water System for Chemical Warfare Agents Degradation

Chemical Warfare Agents

Water adsorption in UiO-66: the importance of defects.

Simulated adsorption isotherms for water in UiO-66 illustrate that defects in the form of missing linkers make this MOF more hydrophilic. Heats of adsorption and density plots further confirm the effect of defects on adsorption of water in UiO-66 at low loadings. In addition, water and CO2 isotherms indicate that not only the amount of defects but their locations within the material affect the ...

Preparation of N, N-dichloropolystyrene sulfonamide nanofiber as a regenerable self-decontaminating material for protection against chemical warfare agents

N,N-dichloropolystyrene sulfonamide as a decontaminant was synthesized in 5 steps from styrene monomer. Styrene was first polymerized. Then, sulfonation reaction was performed by H2SO4 (c) followed by chlorination with POCl3 obtain chlorosulfonated polystyrene. Amidification reaction was then applied to get sulfonamide resin. Sulfonamide resin was treat...

Anesthesia for Casualties of Chemical Warfare Agents

Preparation of N, N-dichloropolystyrene sulfonamide nanofiber as a regenerable self-decontaminating material for protection against chemical warfare agents

N,N-dichloropolystyrene sulfonamide as a decontaminant was synthesized in 5 steps from styrene monomer. Styrene was first polymerized. Then, sulfonation reaction was performed by H2SO4 (c) followed by chlorination with POCl3 obtain chlorosulfonated polystyrene. Amidification reaction was then applied to get sulfonamide resin. Sulfonamide resin was treat...